Method to increase removal rate of oxide using fixed-abrasive

A method of polishing an over-filled oxide topographic feature on a substrate by fixed-abrasive chemical-mechanical polishing, said method comprising:

• a) providing a substrate having an oxide layer on a first surface, said oxide layer having (i) an overfill thickness across substantially all of said layer, and (ii) portions above said overfill thickness which have a height differential relative to each other, said thickness and height being measured from a reference plane parallel with a principal plane of said substrate,
• b) providing a first aqueous liquid medium containing a polyelectrolyte,
• c) contacting said oxide layer with said first aqueous liquid medium and with a polishing member, the polishing member containing a fixed-abrasive component therein,
• d) maintaining the contact of step c) while providing movement between the substrate and polishing member, whereby said height differential becomes reduced,
• e) providing an second aqueous liquid medium containing a first abrasive component,
• f) contacting said oxide layer from step d) with said second aqueous liquid medium and with said polishing member, and
• g) maintaining the contact of step f) while providing movement between said substrate and polishing member, whereby said overfill thickness is reduced.