Mask clamping apparatus, e.g. for a lithographic apparatus
AssigneeASML Netherlands B.V.
InventorsSjoerd N. L. Donders, Tjarko A. R. van Empel
Life of this patent
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Abstract
An apparatus for supporting a mask comprises a pair of members. The mask held against each member by a vacuum arrangement which prevents relative motion between the mask and members. The members are compliant such that they accommodate flatness variations in the mask but without deforming the mask.
Claims26
A lithographic projection apparatus for imaging of a mask pattern in a mask onto a substrate provided with a radiation-sensitive layer, the apparatus comprising:
- a radiation system constructed and arranged to supply a projection beam of radiation;
- a first object table for holding a mask having a stiffness;
- a second object table for holding a substrate;
- a projection system constructed and arranged to image irradiated portions of the mask onto target portions of the substrate;
- said mask table including at least one compliant member constructed and arranged to hold said mask such that said at least one compliant member yields to conform substantially to a profile of the mask, wherein a portion of said at least one compliant member is in direct contact with said mask and said portion has a stiffness lower than the stiffness of the mask.
An apparatus according to 7, comprising four supports, wherein each support is arranged to support said mask proximate a respective one of its corners.
A method of manufacturing a device comprising:
- providing a mask bearing a pattern to a first object table;
- providing a substrate provided with a radiation-sensitive layer to a second object table;
- and
- irradiating portions of the mask and imaging irradiated portions of the mask onto target portions of said substrate;
- holding said mask, during operation, on said first object table with the aid of at least one compliant member such that said at least one compliant member yields to conform substantially to the profile of the mask, wherein a portion of said at least one compliant member is in direct contact with said mask and said portion has a stiffness lower than the stiffness of the mask.
A mask table comprising at least one compliant member for holding a mask such that said at least one compliant member yields to conform substantially to the profile of the mask, wherein a portion of said at least one compliant member is in direct contact with said mask and said portion has a stiffness lower than the stiffness of the mask.
Dependencies are inferred from the claim text.