Metal oxide semiconductor field effect transistor having a relatively high doped region in the channel for improved linearity
AssigneeOphir RF, Inc.
InventorLarry M. Tichauer
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AssigneeOphir RF, Inc.
InventorLarry M. Tichauer
Estimating the term…
A field effect transistor is disclosed having a relatively high doped region (of the same type dopant as the channel) to reduce the change in the depletion region within the channel with changes in the drain voltage (Vd). Changes in the drain current (Id) with changes in the drain voltage (Vd) is a cause of non-linearity for traditional MOSFET. Because of the additional higher doped region provided in the channel, the depletion region within the higher doped region changes less with changes in the drain voltage (Vd). The higher doped region is situated near the top of the channel, where most of the drain current flows. Thus, the higher doped region dominates the drain current through the device. Since the drain current is less susceptible to changes in drain voltage (Vd), a more linear device results.
A field effect transistor, comprising:
An amplifier, comprising:
A field effect transistor, comprising:
Dependencies are inferred from the claim text.