Lamp array for thermal processing chamber
AssigneeApplied Materials, Inc.
InventorsThomas E. Deacon, Roger N. Anderson, David K. Carlson, Paul Comita
Life of this patent
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Abstract
A lamp array for a thermal processing chamber. The lamp array includes a plurality of lamps arranged in a generally circular array. The plurality of lamps can be arranged in one or more concentric rings to form a generally circular array. Additional lamp arrays can be provided adjacent the circumference of the circular array or outermost concentric ring to provide a generally rectangular heating pattern. At least one row of lamps can be provided tangentially to the circular portion of the lamp array to provide preheating or postheating of process gases in the flow direction of a rectangular processing chamber.
Claims35
A lamp array for a thermal processing chamber, the lamp array comprising:
- a plurality of lamps arranged in a generally circular array, said circular array defining two diameters;
- and
- at least one corner lamp adjacent said circular array at at least one end of at least one of said two diameters.
A thermal processing chamber comprising:
- a platform defining a semiconductor substrate holding area;
- a first lamp array including a plurality of lamps arranged in a generally circular array, said circular array having two diameters;
- and
- at least one lamp adjacent said circular array at each end of each of said two diameters.
A lamp array for a thermal processing chamber, the lamp array comprising:
- a plurality of lamps arranged in at least two concentric rings, wherein the outermost one of said at least two concentric rings defines two diameters;
- and
- at least one corner lamp adjacent said outermost concentric ring at each end of each of said two diameters.
A thermal processing chamber comprising:
- a platform defining a semiconductor substrate holding area;
- a first lamp array having a plurality of lamps arranged in at least two concentric rings, said first lamp array positioned relative to said platform such that said first lamp array provides radiant heat to said semiconductor substrate holding area, wherein the outermost one of said at least two concentric rings defines two diameters;
- and
- at least one corner lamp adjacent said outermost concentric ring at each end of each of said two diameters.
A method for thermally processing a semiconductor substrate, the method comprising:
- heating the substrate in a processing chamber, said processing chamber including a lamp array having a plurality of lamps arranged in a generally circular array, said circular array defining two diameters, said lamp array further including at least one corner lamp adjacent said circular array at each end of each of said two diameters.
A method for thermally processing a semiconductor substrate, the method comprising:
- heating the substrate in a processing chamber, said processing chamber including a lamp array having a plurality of lamps arranged in at least two concentric rings, wherein the outermost one of said at least two concentric rings defines two diameters, and said lamp array further having at least one corner lamp adjacent said outermost concentric ring at each end of each of said two diameters.
Dependencies are inferred from the claim text.