Alternative photoresist stripping solutions
AssigneeHuntsman Petrochemical Corporation
InventorsJames R. Machac, Jr., Edward T. Marquis, Wheeler C. Crawford
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Abstract
The present invention is directed toward effective photoresist stripping compositions that are less corrosive and do not cause skin irritation. One form of the present invention is a composition useful as a photoresist remover that includes an alkylene carbonate, and one or more additional components chosen from the group that includes alkyl hydrogen peroxides, hydroxyalkyl ureas, urea-hydrogen peroxides, N-substituted morpholines and alcohols. Another form of the present invention is a composition for removing photoresist from a surface that includes an N-substituted morpholine.
Claims4
A composition useful as a photoresist remover that comprises propylene carbonate, an organic peroxide, and N-formyl morpholine.
Dependencies are inferred from the claim text.