Positive photoresist composition comprising a phenolic compound having both an acid-decomposable group and a naphthoquinonediazide sulfonyl group

A positive photoresist composition comprising:

• (A) an alkali-soluble resin;
• (B) a quinonediazide ester represented by the following Formula (I):
• wherein each of R1, R2, R3, R4, R5, R6, R7 and R8 is independently a hydrogen atom, a halogen atom, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or a cycloalkyl group;
• each of R9, R10 and R11 is independently a hydrogen atom or an alkyl group having 1 to 6 carbon atoms;
• Q is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, or Q is combined with R9 to form a cyclic ring having 3 to 6 carbon atom members, or a residue represented by the following Formula (II):
• wherein each of R12 and R13 is independently a hydrogen atom, a halogen atom, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or a cycloalkyl group;
• and c denotes an integer of 1 to 3;
• each of D is independently a hydrogen atom, a 1,2-naphthoquinonediazidosulfonyl group, or an acid-decomposable group, where at least one of D is a 1,2-naphthoquinonediazidosulfonyl group and at least one of D is an acid-decomposable group;
• each of a and b independently denotes an integer of 1 to 3;
• d denotes an integer of 0 to 3;
• and n denotes an integer of 0 to 3;
• and
• (C) a compound which generates an acid upon irradiation of light with a wavelength of 365 nm.