Gas dispersion head
AssigneeMoore Epitaxial, Inc.
InventorsGary M. Moore, Katsuhito Nishikawa
Life of this patent
Estimating the term…
Abstract
A semiconductor processing system includes a reactor and a dispersion head within the reactor. During use, process gas is supplied to the dispersion head. The process gas flows through distributors of the dispersion head and into the reactor. The process gas contacts substrates in the reactor thus forming a layer on the substrate. Use of the dispersion head reduces and/or eliminates turbulence and recirculation in the flow of the process gas through the reactor. This results in the formation of layers on the substrates having excellent thickness uniformity. This also allows realization of an abrupt transition between layers formed on the substrates.
Claims41
A system comprising:
- a barrel reactor having a circular cross-sectional shape;
- a first dispersion head within said barrel reactor, said first dispersion head comprising at least one distributor, said at least one distributor comprising a first distributor, a second distributor, and a third distributor, said first dispersion head and said first distributor, said second distributor, and said third distributor lying on a circle, said circle being concentric with said circular cross-sectional shape;
- and
- a second dispersion head, said second dispersion head lying on said circle.
A system comprising:
- a barrel reactor;
- a first dispersion head within said barrel reactor, said first dispersion head comprising:
- at least one distributor;
- a first dispersion head coupling, wherein said first dispersion head coupling is a mount for supporting said first dispersion head in said barrel reactor, said first dispersion head coupling being located at a first end of a channel section of said first dispersion head;
- and
- a support at a second end of said channel section opposite said first end;
- and
- a purge baffle having a slot, said support being positioned in said slot.
A system comprising:
- a reactor having a circular cross-sectional shape;
- a first dispersion head within said reactor, said first dispersion head comprising at least one distributor, said at least one distributor comprising a first distributor, a second distributor, and a third distributor, said first dispersion head and said first distributor, said second distributor, and said third distributor lying on a circle, said circle being concentric with said circular cross-sectional shape;
- a second dispersion head, said second dispersion head lying on said circle;
- a horizontal substrate carrier;
- and
- a substrate, a principal surface of said substrate being substantially perpendicular to a longitudinal axis of said reactor.
A system comprising:
- a barrel reactor having a circular cross-sectional shape;
- a first dispersion head within said barrel reactor, said first dispersion head comprising a first distributor, a second distributor, and a third distributor, wherein said first distributor, said second distributor, and said third distributor of said first dispersion head are centered on a circle concentric with said circular cross-sectional shape;
- and
- a second dispersion head comprising a first distributor, a second distributor, and a third distributor, wherein said first distributor, said second distributor, and said third distributor of said second dispersion head are centered on said circle.
A system comprising:
- a barrel reactor;
- a seal plate;
- a gas ring between said seal plate and said barrel reactor;
- at least one gas injector located in said gas ring;
- and
- a first dispersion head within said barrel reactor and adjacent said seal plate, said first dispersion head comprising at least one distributor.
Dependencies are inferred from the claim text.