Solution of tetramethylammonium hydroxide in water and a process for preparing the solution
AssigneeInfineon Technologies AG
InventorsStefan Geyer, Michael Horn
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Abstract
A solution of tetramethylammonium hydroxide in water comprises a surfactant component and a hydrotropic component. A process for preparing a solution for developing an exposed photoresist comprises the steps: preparation of a solution of tetramethylammonium hydroxide in water; addition of a surfactant component; and addition of a hydrotropic component.
Claims21
A concentrated developer solution, adapted for dilution with water to a use concentration, comprising:
- a base component of water, a component of tetramethylammonium hydroxide, a surfactant component, and a hydrotropic component in the solution, wherein said hydrotropic component comprises at least one material selected from the group consisting of cumenesulfonic acid, tetramethylammonium cumenesulfonate, tetramethylammonium xylenesulfonate, tetramethylammonium phenolsulfonate, tetramethylammonium toluenesulfonate, and tetramethylammonium benzenesulfonate.
A process for preparing a concentrated developer solution, adapted for dilution with water to a use concentration, which comprises the following steps:
- a) preparing a solution of tetramethylammonium hydroxide in water;
- b) adding a surfactant component to the solution;
- and
- c) adding a hydrotropic component to the solution, wherein the hydrotropic component includes at least one material selected from the group consisting of cumenesulfonic acid, tetramethylammonium cumenesulfonate, tetramethylammonium xylenesulfonate, tetramethylammonium phenol-sulfonate and tetramethylammonium benzene-sulfonate.
Dependencies are inferred from the claim text.