Method for measuring reticle leveling in stepper
AssigneeHyundai Electronics Industries Co., Ltd.
InventorHoon Huh
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Abstract
A method for measuring a reticle leveling in a semiconductor exposure device includes the steps of loading a reticle onto a stage of an exposure device, the reticle having a main cell region and a plurality of grating patterns at outer sides of the main cell region, directing a light from a light source to the plurality of grating patterns measuring electrical signals based on aerial images formed by the light passed through the grating patterns, and comparing the electrical signals and offsetting a reticle level if a substantial difference exists.
Claims7
A method for measuring a reticle leveling in a semiconductor exposure device comprising the steps of:
- loading a reticle onto a stage of an exposure device, the reticle having a main cell region and a plurality of grating patterns at outer sides of the main cell region;
- directing a light from a light source to the plurality of grating patterns;
- measuring electrical signals based on aerial images formed by the light passed through the grating patterns;
- and
- comparing the electrical signals and offsetting a reticle level if a substantial difference exists.
Dependencies are inferred from the claim text.