Method for polishing a memory or rigid disk with an amino acid-containing composition
AssigneeCabot Microelectronics Corporation
InventorsMingming Fang, Shumin Wang
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Abstract
A method of planarizing or polishing the surface of a memory or rigid disk comprising abrading at least a portion of the surface with (i) a polishing composition comprising an oxidizing agent selected from the group consisting of persulfates and peroxides, an amino acid, and water, and (ii) an abrasive.
Claims25
A method for planarizing or polishing the surface of a memory or rigid disk comprising abrading at least a portion of the surface with (i) a polishing composition comprising (a) an oxidizing agent selected from the group consisting of persulfates and peroxides, (b) an amino acid, and (c) water, and (ii) an abrasive selected from the group consisting of alumina, silica, titania, ceria, germania, magnesia, and combinations thereof, wherein the amino acid is present in an amount of about 0.1-10 wt. % of the composition.
Dependencies are inferred from the claim text.