Semiconductor memory cell array with reduced parasitic capacitance between word lines and bit lines

A semiconductor memory device including a plurality of memory cells in which each memory cell includes a first and a second nMOS transistor, and additionally, a first and a second pMOS transistor connected between a drain of an nMOS transistor and a power supply voltage line, respectively, and an nMOS transistor formation region where the first and the second NMOS transistors are formed and a pMOS transistor formation region where the first and the second pMOS transistors are formed and are arranged so as to extend along in the same direction as the direction along which a bit line extends, the semiconductor memory device comprising:

• a main word line for inputting a common drive signal to a predetermined word line driver, the main word line being formed in a layer below the bit line and being disposed so as to avoid a bit line contact to electrically connect the bit line and a transistor region in a layer below the main word line, said plurality of memory cells being arranged in a plurality of adjacent memory cell rows which, in turn, form a memory cell array, wherein the main word line is disposed every two memory cell rows and part of the main word line extends to the row adjacent to the two memory cell rows.

A semiconductor memory device including a plurality of memory cells in which each memory cell includes a first and a second NMOS transistor, and additionally, a first and a second pMOS transistor connected between a drain of an nMOS transistor and a power supply voltage line, respectively, and an nMOS transistor formation region where the first and the second nMOS transistors are formed and a pMOS transistor formation region where the first and the second pMOS transistors are formed and are arranged so as to extend along in the same direction as the direction along which a bit line extends, the semiconductor memory device comprising:

• a main word line for inputting a common drive signal to a predetermined word line driver, the main word line being formed in a layer below the bit line and being disposed so as to avoid a bit line contact to electrically connect the bit line and a transistor region in a layer below the main word line, said plurality of memory cells being arranged in a plurality of adjacent memory cell rows which, in turn, form a memory cell array, wherein the main word line is disposed repeatedly every three memory cell rows in a direction along which the memory cell array lies.

A semiconductor memory device including a plurality of memory cells in which each memory cell includes a first and a second nMOS transistor, and additionally, a first and a second pMOS transistor connected between a drain of an nMOS transistor and a power supply voltage line, respectively, and an nMOS transistor formation region where the first and the second nMOS transistors are formed and a pMOS transistor formation region where the first and the second pMOS transistors are formed and are arranged so as to extend along in the same direction as the direction along which a bit line extends, the semiconductor memory device comprising:

• a main word line for inputting a common drive signal to a predetermined word line driver, the main word line being formed in a layer below the bit line and being disposed so as to avoid a bit line contact to electrically connect the bit line and a transistor region in a layer below the main word line, said plurality of memory cells being arranged in a plurality of adjacent memory cell rows which, in turn, form a memory cell array, wherein the main word line is disposed repeatedly every four memory cell rows in a direction along which the memory cell array lies.

A semiconductor memory device including a plurality of memory cells in which each memory cell includes a first and a second nMOS transistor, and additionally, a first and a second pMOS transistor connected between a drain of an nMOS transistor and a power supply voltage line, respectively, and an nMOS transistor formation region where the first and the second nMOS transistors are formed and a pMOS transistor formation region where the first and the second pMOS transistors are formed and are arranged so as to extend along in the same direction as the direction along which a bit line extends, the semiconductor memory device comprising:

• a main word line for inputting a common drive signal to a predetermined word line driver, the main word line being formed in a layer below the bit line and being disposed so as to avoid a bit line contact, said plurality of memory cells being arranged in a plurality of adjacent memory cell rows which, in turn, form a memory cell array, wherein the main word line is disposed every two memory cell rows having a shape combining a pattern such that part of the main word line is arranged so as to extend to the row adjacent to the two memory cell rows and a pattern such that the main word line is disposed repeatedly every four memory cell rows in a direction along which the memory cell array lies.