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US 6,444,375 B1Granted
Method for manufacturing a mask
AssigneeSamsung Electronics Co., Ltd.
InventorsSeung-hyung Nam, Tae-ho Jang
Life of this patent
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Abstract
An exposing method comprises use of different kinds of aligning and exposing apparatuses having different alignment and exposure characteristics. Capability to select a suitable aligning and exposing apparatus for each layer to be formed is accomplished by manufacturing a mask used for the exposure to be compatible with different kinds of aligning and exposing apparatuses.
Claims3
A method for manufacturing a mask to be used in an exposing method for producing multiple material layers of a semiconductor device comprising:
- evaluating precision characteristics of different aligning and exposing apparatuses;
- assessing precision requirements for the material layers of the semiconductor device to be manufactured;
- selecting suitable apparatuses from the different aligning and exposing apparatuses to meet the requirements for each of the multiple material layers of the semiconductor device;
- analyzing mask characteristics required for use with each selected aligning and exposing apparatus;
- and
- fabricating a mask incorporating the required mask characteristics of each of the selected different apparatuses so that the mask may be used with each of the different apparatuses.
3 more elements
Dependencies are inferred from the claim text.