Back to results
US 6,444,373 B1Granted
Modification of mask layout data to improve mask fidelity
AssigneeAdvanced Micro Devices, Inc.
InventorsRamkumar Subramanian, Khoi A. Phan, Bhanwar Singh, Bharath Rangarajan
Life of this patent
Estimating the term…
Abstract
The present invention relates to a system and method of modifying mask layout data to improve the fidelity of mask manufacture. The system and method include determining the difference between the mask layout design and the mask features as written, and generating sizing corrections. The sizing corrections can be used to modify the mask layout data, and/or stored in a database.
Claims15
A system for manufacturing a mask, comprising:
- an edge detector, the edge detector determining one or more edge data of a portion of a mask feature;
- a processor, the processor receiving the one or more edge data and operatively coupled to an algorithm for calculating one or more area loss data from the one or more edge data;
- and
- a mask writer, the mask writer operatively coupled to the processor to receive the one or more area loss data.
1 more element
A system for manufacturing a mask, comprising:
- an edge detector, the edge detector determining one or more edge data;
- a processor, the processor receiving the one or more edge data and operatively coupled to the one or more algorithms for determining one or more sizing correction data from the one or more edge data, wherein the one or more algorithms for determining sizing correction data utilize one or more area loss data generated from the one or more edge data;
- and
- a mask writer, the mask writer operatively coupled to the processor to receive the one or more sizing correction data.
1 more element
Dependencies are inferred from the claim text.