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US 6,444,040 B1Granted
Gas distribution plate
AssigneeApplied Materials, Inc.
InventorsHarald Herchen, David Palagashvili, Dmitry Lubomirsky, Alex Schreiber
Life of this patent
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Abstract
An apparatus for use in a substrate processing system. The apparatus is generally a fluid distribution plate comprising an inner disk and an outer ring. The fluid distribution plate has a plurality of openings for fluid distribution and at least one slot defined therein.
Claims18
A fluid distribution plate for use in a substrate processing system, comprising:
- an inner disk having a plurality of openings and at least one slot defined therein;
- and
- an outer ring having a plurality of openings and at least one slot defined therein and disposed around the inner disk, where at least one slot extends entirely through the outer ring and a gap is defined between the inner disk and outer ring.
A fluid distribution plate for use in a substrate processing system, comprising:
- an inner disk having a plurality of openings defined therein and at least one slot extending from a perimeter of the inner disk radially inward;
- and
- an outer ring disposed around and spaced apart from the inner disk;
- the outer ring having a plurality of openings defined therein and at least one slot extending entirely through the outer ring from an outer perimeter to an inner perimeter and a gap is defined between the inner disk and outer ring.
1 more element
Dependencies are inferred from the claim text.