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US 6,444,039 B1Granted
Three-dimensional showerhead apparatus
AssigneeSimplus Systems Corporation
InventorTue Nguyen
Life of this patent
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AssigneeSimplus Systems Corporation
InventorTue Nguyen
Estimating the term…
A vapor supply apparatus, for use in a semiconductor device manufacturing process, provides a three-dimensional showerhead for supplying various precursors to a reaction chamber. The three-dimensional showerhead comprises an inverted-cup structure having double walls, an outer wall and an inner wall, with the double walls defining a first interior volume and the inner wall defining an exterior cavity, the inverted-cup structure further has a plurality of first inlet ports connected to the outer wall for introducing first precursors into the first interior volume and a plurality of first outlet ports at the inner wall for discharging the first precursor vapor from the first interior volume to the exterior cavity. The three-dimensional showerhead confines the precursor vapor inside the external cavity to modify the processed film characteristics.
A three-dimensional showerhead for a vapor supply apparatus comprising an inverted-cup structure having double walls, an outer wall and an inner wall, said inner wall having a horizontally positioned top inner wall and a vertically positioned side inner wall, said double walls defining a first interior volume and said inner wall defining an exterior cavity, said structure further having:
A two-zone showerhead for a vapor supply apparatus comprising a body structure having double walls, an outer wall and an inner wall, said inner wall having a horizontally positioned top inner wall and a vertically positioned side inner wall, said double walls defining a first interior volume and said inner wall defining an exterior cavity, said structure further having:
Dependencies are inferred from the claim text.