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US 6,440,639 B1Granted
High-aspect ratio resist development using safe-solvent mixtures of alcohol and water
AssigneeInternational Business Machines Corporation
InventorsRobert E. Fontana, Jr., Jordan A. Katine, Ernst Kratschmer, Michael J. Rooks, Ching H. Tsang, Raman Gobichettipalayam Viswanathan
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Abstract
A high-aspect ratio resist profile is obtained using a development process wherein a mixture of an alcohol and water is used as the developer. The alcohol/water mixture is non-toxic, and does not cause excess swelling and cracking of the resist during the development process.
Claims10
A method of providing a high-aspect ratio resist profile to a resist comprising the steps of:
- (a) applying a non-aqueous developable, polymeric resist to a surface of a substrate needing patterning;
- (b) forming a high-aspect ratio profile pattern in said non-aqueous developable, polymeric resist by exposing the same to an energy beam, wherein said high-aspect ratio profile pattern has a depth to width ratio of 5 or greater;
- and
- (c) developing the high-aspect ratio profile pattern m said non-aqueous developable, polymeric resist using an alcohol/water mixture.
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Dependencies are inferred from the claim text.