Photomask structure
AssigneeUnited Microelectronics Corp.
InventorsErwin Deng, Sylvia Hwang
Life of this patent
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Abstract
A photomask structure with an anti-electrostatic-discharge (Anti-ESD) ability. The photomask structure comprises a photomask, a conductive dust pellicle, a conductive frame and a conductive film. The photomask possesses a first surface and a pattern is located on the first surface. The conductive dust pellicle is coupled with the photomask through the conductive frame and the pattern is enclosed by the conductive dust pellicle, the conductive frame and the photomask. The conductive film covers a surface of the photomask uncovered by the conductive dust pellicle and the conductive frame. The conductive dust pellicle, the conductive frame and the conductive film constitute a conductive structure enclosing the photomask.
Claims16
A photomask structure with an anti-electrostatic-discharge ability, comprising:
- a photomask having a first surface, wherein a pattern is located on the first surface;
- a conductive dust pellicle;
- a conductive frame, wherein the conductive dust pellicle is electrically coupled with the photomask through the conductive frame and the pattern is enclosed by the conductive dust pellicle, the conductive frame and the photomask;
- and
- a conductive film covering a surface of the photomask uncovered by the conductive dust pellicle and the conductive frame, wherein the conductive dust pellicle, the conductive frame and the conductive film constitute a conductive structure enclosing the photomask.
A photomask structure with an anti-electrostatic-discharge ability, comprising:
- a photomask having a first surface, wherein a pattern is located on the first surface;
- and
- a closed conductive structure enclosing the photomask, wherein the conductive structure comprises:
- a conductive frame;
- a conductive dust pellicle electrically coupled with the photomask through the conductive frame, wherein the pattern is enclosed by the conductive dust pellicle, the conductive frame and the photomask;
- and
- a conductive film enclosing the photomask exposed by the conductive dust pellicle and the conductive frame.
Dependencies are inferred from the claim text.