Back to results
US 6,440,612 B1Granted
Field correction of overlay error
AssigneeMicron Technology, Inc.
InventorBill Baggenstoss
Life of this patent
Estimating the term…
Abstract
Methods of correcting for overlay error, wherein the methods account for relative offset across the field of exposures of more than one photolithography projection system, as well as systems to perform the methods and apparatus produced therefrom. The methods include defining at least two zones within a field of a mask having substantially similar overlay error values. The methods further include modifying the coordinates of a feature of the mask in response to a correction for the zone to which the feature is mapped, where the correction corresponds to a nominal overlay error value for that zone.
Claims28
A method of correcting a mask, comprising:
- determining overlay error variation across a field of the mask by measuring overlay error values at a plurality of locations within the field;
- defining at least two zones within the field of the mask, wherein each zone is a continuous portion of the plurality of locations within the field containing substantially similar overlay error values, and wherein each zone has a nominal overlay error value;
- defining a correction for each of the at least two zones, wherein the correction for each zone is approximately the nominal overlay error value for that zone;
- mapping a feature of the mask to one of the at least two zones;
- and
- modifying coordinates of the feature in response to the correction for a zone to which the feature is mapped.
3 more elements
A method of correcting a mask, comprising:
- determining overlay error variation across a field of the mask;
- defining at least two zones within the field of the mask, wherein each zone is a continuous portion of the field containing substantially similar overlay error values, and wherein each zone has a nominal overlay error value;
- defining a correction for each of the at least two zones, wherein the correction for each zone is approximately the nominal overlay error value for that zone;
- mapping a feature of the mask to one of the at least two zones;
- modifying coordinates of the feature in response to the correction for the one of the at least two zones to which the feature is mapped;
- wherein defining at least two zones further comprises defining zones to contain overlay error values within an allowable variation of the nominal overlay error value;
- and
- wherein the allowable variation for one zone is different than the allowable variation for another zone.
5 more elements
A method of correcting a mask having a plurality of features, comprising:
- determining overlay error variation across a field of the mask by measuring overlay error values at a plurality of locations within the field;
- defining at least two zones within the field of the mask, wherein each zone is a continuous portion of the plurality of locations within the field containing substantially similar overlay error values, wherein each zone contains separate ones of the plurality of locations within the field and wherein each zone has a nominal overlay error value;
- defining a correction for each of the at least two zones, wherein the correction for each zone is approximately the nominal overlay error value for that zone;
- mapping each of the plurality of features to one of the at least two zones;
- and
- modifying coordinates of each of the plurality of features in response to the correction for a zone in which each feature is mapped.
3 more elements
A method of correcting a mask, comprising:
- determining overlay error variation across a field of the mask by measuring overlay error values at a plurality of locations within the field;
- defining at least two distinct zones within the field of the mask, wherein each zone is a continuous portion of the field containing substantially similar overlay error values, and wherein each zone has a nominal overlay error value which is different from a nominal overlay value of other zones;
- defining a correction for each of the at least two zones, wherein the correction for each zone is approximately the nominal overlay error value for that zone;
- mapping each portion of a feature of the mask to one of the at least two zones;
- and
- modifying coordinates of each portion of the feature in response to the correction for a zone in which each portion is mapped.
3 more elements
A method of correcting a mask having a plurality of features, comprising:
- determining overlay error variation of overlay error values within a field of the mask;
- defining at least two discrete zones within the field of the mask, wherein each zone is a continuous portion of the field containing substantially similar overlay error values from within the field, and wherein each zone has a nominal overlay error value;
- defining a correction for each of the at least two zones, wherein the correction for each zone is approximately the nominal overlay error value for that zone;
- mapping each portion of each of the plurality of features to one of the at least two zones;
- and
- modifying coordinates of each portion of each of the plurality of features in response to the correction for a zone in which each portion is mapped.
3 more elements
A method of correcting a mask, comprising:
- determining overlay error variation of a plurality of overlay error values distributed within a field of the mask;
- defining at least two distinct zones within the field of the mask, wherein each zone is a continuous portion of the field containing a unique portion of the plurality of overlay error values which have values within an allowable variation of a nominal overlay error value defined for each zone;
- defining a correction for each of the at least two zones, wherein the correction for each zone is approximately the nominal overlay error value for that zone;
- mapping a feature of the mask to one of the at least two zones;
- and
- modifying coordinates of the feature in response to the correction for a zone to which the feature is mapped.
3 more elements
A method of correcting a mask, comprising:
- determining overlay error variation of overlay error values distributed within a field of the mask;
- defining at least two zones within the field of the mask wherein each zone is a separate portion of the field containing a plurality of unique overlay error values which are selected to be within an allowable variation of a nominal overlay error value defined for each zone;
- defining a correction for each of the at least two zones, wherein the correction for each zone is approximately the nominal overlay error value for that zone;
- mapping a feature of the mask to one of the at least two zones;
- modifying coordinates of the feature in response to the correction for a zone to which the feature is mapped;
- and
- wherein the allowable variation for one zone is different than the allowable variation for another zone.
4 more elements
A method of correcting a mask, comprising:
- determining overlay error variation across a field of the mask by measuring a plurality of overlay error values distributed within the field;
- defining at least two zones within the field of the mask, wherein each zone is a continuous portion of the field containing a unique plurality of overlay error values which lie within an allowable variation of a nominal overlay error value defined for each zone and wherein each nominal overlay error value is selected from the group consisting of an average, a median and a mode of the overlay error values for its associated zone;
- defining a correction for each of the at least two zones, wherein the correction for each zone is approximately the nominal overlay error value for that zone;
- mapping a feature of the mask to only one of the at least two zones;
- and
- modifying coordinates of the feature in response to the correction for a zone to which the feature is mapped.
3 more elements
A method of correcting a mask, comprising:
- determining overlay error variation of overlay error values within a field of the mask;
- defining at least two zones within the interior of the field of the mask, wherein each zone is a separate section of a grid of the field, and wherein each zone has a nominal overlay error value;
- defining a correction for each of the at least two zones, wherein the correction for each zone is approximately the nominal overlay error value for that zone;
- mapping a feature of the mask to one of the at least two zones;
- and
- modifying coordinates of the feature in response to the correction for a zone to which the feature is mapped.
3 more elements
A method of correcting a mask having a plurality of features, comprising:
- measuring overlay error values at a plurality of locations within a field of a mask;
- determining overlay error variation across the field of the mask;
- defining at least two zones within the field of the mask, wherein each zone is a separate section of a grid within the field, and wherein each zone has a nominal overlay error value;
- defining a correction for each of the at least two zones, wherein the correction for each zone is approximately the nominal overlay error value for that zone;
- mapping each of the plurality of features to one of the at least two zones;
- and
- modifying coordinates of each of the plurality of features in response to the correction for a zone in which each feature is mapped.
4 more elements
A method of correcting a mask, comprising:
- determining overlay error variation of a plurality of overlay error values measured as a plurality of locations within a field of the mask;
- defining at least two zones within the field of the mask, wherein each zone is a section of a grid of the field, and wherein each zone has a nominal overlay error value calculated from the overlay error values measured at locations inside that zone;
- defining a correction for each of the at least two zones, wherein the correction for each zone is approximately the nominal overlay error value for that zone;
- mapping each portion of a feature of the mask to one of the at least two zones;
- and
- modifying coordinates of each portion of the feature in response to the correction for a zone in which each portion is mapped.
3 more elements
A method of correcting a mask having a plurality of features, comprising:
- determining overlay error variation within a field of the mask;
- defining at least two separate zones within the field of the mask, wherein each zone is a section of a grid within the field, and wherein each zone has a nominal overlay error value calculated from overlay error values measured at locations inside that zone;
- defining a correction for each of the at least two zones, wherein the correction for each zone is approximately the nominal overlay error value for that zone;
- mapping each portion of each of the plurality of features to one of the at least two zones;
- and
- modifying coordinates of each portion of each of the plurality of features in response to the correction for a zone in which each portion is mapped.
3 more elements
A method of correcting a mask, comprising:
- determining overlay error variation at a plurality of interior locations across a field of the mask;
- defining at least two separate and distinct zones within the interior area of the field of the mask, wherein each zone is a continuous portion of the field containing substantially similar overlay error values, and wherein each zone has a nominal overlay error value calculated from the overlay error values measured at locations inside the zone;
- defining a correction for each of the at least two zones, wherein the correction for each zone is approximately the nominal overlay error value for that zone;
- mapping each portion of a feature of the mask to one of the at least two zones;
- modifying coordinates of each portion of the feature in response to the correction for a zone in which each portion is mapped;
- and
- smoothing the coordinates of the feature about interfaces between each portion.
4 more elements
A method of correcting a mask having a plurality of features, comprising:
- determining a plurality of overlay error values at a plurality of locations within a field of a mask and determining therefrom overlay error variation across a field of the mask;
- defining at least two zones within the field of the mask, wherein each zone is a continuous portion of the field containing substantially similar overlay error values, and wherein each zone has a nominal overlay error value calculated from the overlay error values located inside each zone;
- defining a correction for each of the at least two zones, wherein the correction for each zone is approximately the nominal overlay error value for that zone;
- mapping each portion of each of the plurality of features to one of the at least two zones;
- modifying coordinates of each portion of each of the plurality of features in response to the correction for a zone in which each portion is mapped;
- and
- smoothing the coordinates of each feature about interfaces between each of its portions.
4 more elements
Dependencies are inferred from the claim text.