Pyrazolate copper complexes, and MOCVD of copper using same
AssigneeAdvanced Technology Materials, Inc.
InventorsChongying Xu, Thomas H. Baum, Ziyun Wang
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Abstract
Copper pyrazolate precursor compositions useful for the formation of copper in semiconductor integrated circuits, e.g., interconnect metallization in semiconductor device structures, as an adhesive seed layer for plating, for the deposition of a thin-film recording head and for circuitization of packaging components. The copper pyrazolate precursor compositions include fluorinated and non-fluorinated pyrazolate copper (I) complexes and their Lewis base adducts. Such precursors are usefully employed for liquid delivery chemical vapor deposition of copper or copper-containing material on a substrate.
Claims9
A copper precursor formulation, comprising:
- a precursor composition selected from the group consisting of:
- pyrazolate copper (I) compounds of the formula [(RR′R″)PzCu]3 wherein:
- Pz is a pyrazolyl moiety and R, R′ and R″ are independently the same as or different from one another and each of R, R′ and R″ is independently selected from the group consisting of H, C6-C10 aryl, C6-C10 fluoroaryl, C1-C6 alkyl, C1-C6 fluoroalkyl, C1-C6 perfluoroalkyl, C6-C10 perfluoroaryl and C3-C6 cycloalkyl, with the proviso that at least one R contains fluorine;
- and
- pyrazolate copper (I) Lewis base adducts of the formula (RR′R″)PzCuL wherein:
- Pz is a pyrazolyl moiety and R, R′ and R″ are independently the same as or different from one another and each of R, R′ and R″ is independently selected from the group consisting of H, C6-C10 aryl, C6-C10 fluoroaryl, C1-C6 alkyl, C1-C6 fluoroalkyl, C1-C6 perfluoroalkyl, C6-C10 perfluoroaryl and C3-C6 cycloalkyl, with the proviso that at least one R contains fluorine;
- and L is a Lewis base ligand;
- and
- a solvent composition for the precursor composition.
A copper precursor formulation useful for liquid delivery metalorganic chemical vapor deposition of copper, comprising:
- a precursor composition selected from the group consisting of:
- [(RR′R″)PzCu]3 wherein:
- Pz is a pyrazolyl moiety and R, R′ and R″ are independently the same as or different from one another and each of R, R′ and R″ is independently selected from the group consisting of H, C6-C10 aryl, C6-C10 fluoroaryl, C1-C6 alkyl, C1-C6 fluoroalkyl, C1-C6 perfluoroalkyl, and C3-C6 cycloalkyl;
- and pyrazolate copper (I) Lewis base adducts;
- and
- (RR′R″)PzCuL wherein:
- Pz is a pyrazolyl moiety and R, R′ and R″ are independently the same as or different from one another and each of R, R′ and R″ is independently selected from the group consisting of H, C6-C10 aryl, C6-C10 fluoroaryl, C1-C6 alkyl, C1-C6 fluoroalkyl, C1-C6 perfluoroalkyl, and C3-C6 cycloalkyl, with the proviso that at least one R contains fluorine;
- and L is a neutral Lewis base ligand;
- and
- a solvent composition for the precursor composition.
Dependencies are inferred from the claim text.