Exposure method and apparatus
AssigneeFujitsu Limited
InventorsRyuji Maeda, Mitugu Uemura
Life of this patent
Estimating the term…
Abstract
An exposure method and apparatus are provided. The exposure apparatus of the present invention includes a discontinuous exposure unit which discontinuously exposes the scan-end point in a first field to be scanned on an exposure substrate, and also discontinuously exposes the scan-start point in a second field to be scanned on the exposure substrate. The exposure substrate is moved so that the scan-end point in the first field and the scan-start point in the second field overlap with each other to form an intermediate area to be exposed. In the intermediate area, the exposure of the first field and the exposure of the second field are averaged to prevent a difference in width of the intermediate area. This effect can be achieved without prolonging the exposure time.
Claims19
An exposure apparatus comprising:
- a rotatable polygon which reflects a plurality of laser beams to an exposure substrate through a lens;
- and
- a discontinuous exposure unit which exposes a first field with a scan-end point on the exposure substrate during a first pass, and exposes a second field with a scan start point on the exposure substrate during a second pass, wherein the scan-end point in the first field and
- the scan-start point in the second field overlap to form an intermediate area that is exposed during the first pass and the second pass.
An exposure apparatus comprising:
- a rotatable polygon which reflects a plurality of laser beams to an exposure substrate through a lens;
- and
- a rotation unit which rotates the exposure substrate 180° after a first field on the exposure substrate is exposed in a first pass, wherein a second field on the exposure substrate is exposed in a second pass after the exposure substrate is rotated 180° and a scan-end point in the first field is continuous with a scan-start point in the second field.
An exposure apparatus comprising:
- a rotatable polygon which reflects a plurality of laser beams to scan an exposure substrate through a plurality of lenses, comprising;
- a first lens that exposes a main pattern in the center of a field on the exposure substrate in a scanning direction;
- and
- a second lens and a third lens, smaller than the first lens, that expose peripheral patterns, adjacent to the main pattern.
An exposure method comprising:
- irradiating a first field with a scan end point on an exposure substrate with a plurality of laser beams reflected from a rotatable polygon through a lens;
- moving the exposure substrate so that the scan-end point in the first field and a scan-start point in a second field overlap to form an intermediate area;
- and
- irradiating the second field with the scan-start point on the exposure substrate.
An exposure method comprising:
- irradiating an exposure substrate with a plurality of laser beams reflected from a rotatable polygon through a lens;
- exposing a first field with a scan-end point on the exposure substrate;
- rotating the exposure substrate 180°, so that the scan-end point in the first field becomes continuous with a scan-start point in a second field to be scanned on the exposure substrate;
- and
- exposing the second field on the exposure substrate.
An exposure method comprising:
- irradiating an exposure substrate with a plurality of laser beams reflected from a rotatable polygon through a plurality of lenses;
- exposing a main pattern of the exposure substrate in a scanning direction with a first lens;
- and
- exposing a plurality of peripheral patterns, smaller than the main pattern, of the exposure substrate with second and third lenses, the peripheral patterns being adjacent to the main pattern.
Dependencies are inferred from the claim text.