Surface analyzing apparatus
AssigneesSeiko Instruments Inc., Mitsubishi Denki Kabushiki Kaisha
InventorsShigeru Wakiyama, Naohiko Fujino
Life of this patent
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Abstract
It is so adapted that a sample is mounted on three-dimensional stages through a sample holder and a beam light emitted from a beam light oscillator is applied to a sample surface through a polarizing element different from polarization of the beam light or directly. An image of a foreign-matter on the sample surface scattered by the beam light is displayed on a monitor through a polarizing element different from the beam light, through a CCD camera mounted on an optical microscope. As a method of bringing the beam light until it is applied to the sample surface, there are a method of using an optical fiber for the beam light and a method of using an optical part such as a mirror.
Claims12
An observation system for observing a sample, comprising:
- a beam light applying system for projecting a beam of light onto a sample surface;
- observation means for receiving light reflected from the sample surface in response to application of the beam light thereto and for confirming the existence and location of foreign matter on the sample surface by observing scattering of the applied beam light by the foreign matter;
- and a polarizing element for polarizing light in such a manner that light scattered by a regular pattern on the sample is reduced by the polarization and light scattered by foreign matter on the sample is not reduced by the polarization.
Dependencies are inferred from the claim text.