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AssigneeSilicon Light Machines Corporation
InventorsAlexander Payne, Christopher Gudeman, James Hunter, Michael Bruner, Clinton Carroll
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A method of treating silicon-based surfaces for reducing charge migration is disclosed. In accordance with the method, a silicon-based surface is treated with Nitrogen-rich pacifying gas environment, after the surface is actuated. The surface is actuated in a drying step, wherein residual water or moisture is removed from the surfaces at an elevated temperature and a reduced pressure. The method of the instant invention is particularly useful for the treatment of ribbon surfaces in grating light valve device, wherein after the ribbon surfaces are treated according to the current invention, surface charging remains low for several days, even in open air conditions.
A method of treating a silicon-based surfaces of a micro-device structure comprising a plurality of movable surfaces, the method comprising:
The method of 1, wherein the vacuum environment is maintained at a pressure of 10−6 Torr, or less.
A method of making a grating light valve device comprising the steps of
The method of 13, wherein the vacuum environment is adjusted to a pressure below 10−6 Torr, or less.
Dependencies are inferred from the claim text.