Positive photoresist composition
AssigneeFuji Photo Film Co., Ltd.
InventorsKazuyoshi Mizutani, Shoichiro Yasunami
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Abstract
Disclosed is a positive photoresist composition comprising a polysiloxane containing as a copolymerization component at least a structural unit represented by the following formula (I): wherein L represents a single bond or an arylene group, A′ represents an aromacyclic or alicyclic structure which may have a substituent, and n represents an integer of 1 to 6.
Claims13
A positive photoresist composition comprising a polysiloxane 1 containing as a copolymerization component at least a structural unit represented by the following formula (I):
- wherein L represents a single bond or an arylene group, A′ represents an aromacyclic or alicyclic structure which may have a substituent, and n represents an integer of 1 to 6.
A positive photoresist composition comprising a polysiloxane 2 containing at least a siloxane structural unit represented by the following formula (I) and a siloxane structural unit having a group capable of decomposing by an acid to generate an alkali-soluble group:
- wherein L represents a single bond or an arylene group, A′ represents an aromacyclic or alicyclic structure which may have a substituent, and n represents an integer of 1 to 6.
Dependencies are inferred from the claim text.