Moving heaters disposed in a susceptor device in a masked sputtering chamber
AssigneeHannstar Display Corp.
InventorsTun-Ho Teng, Ching-Chao Wang
Life of this patent
Estimating the term…
Abstract
A susceptor device in a masked sputtering chamber is disclosed. The device of the present invention comprises a susceptor, a lifter and at least one heater. The susceptor, having at least one trench, is coupled with the lifter having at least one rod. The heater is disposed in the trench and coupled with the rod through the access hole at the bottom of the trench. After the sputtering process for forming indium tin oxide (ITO) film is completed, a baking process is applied to the mask in the chamber for converting the amorphous ITO film formed on the mask to polycrystalline ITO film, thereby increasing the life of the mask.
Claims6
A susceptor device in a masked sputtering chamber, wherein a baking, process is applied to the mask after the sputtering process is completed, comprising:
- a susceptor, disposed in the chamber, having a positioning surface on which a substrate is placed, a supported surface opposite the positioning surface, at least one trench located on the positioning surface and at least one access hole through the supported surface from the trench;
- a lifter having a supporting portion to prop up the supported surface and at least one supporting rod, wherein one end of the rod is driven by the lifter and the other end passes through the access hole moving between a first position and a second position;
- and
- at least one heater coupled with the other end of the rod through the access hole, wherein the heater is positioned in the trench to accommodate placement of the substrate on the positioning surface when the other end of the rod is in the first position, and the heater is elevated above the trench to bake the mask when the other end of the rod is at the second position.
Dependencies are inferred from the claim text.