ESRF chamber cooling system and process
AssigneeTokyo Electron Limited
InventorWayne L. Johnson
Life of this patent
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Abstract
A method and system for cooling an electrostatically shielded radio frequency (ESRF) plasma source. The method and system utilize an electrostatic shield, having plural ribs, which vaporizes a coolant and sprays the vapor against a process tube or a bias shield. The vapor is either sprayed underneath the ribs or between adjacent ribs. This design avoids using baths of liquid coolants that can absorb gases which lead to arcing between induction coils.
Claims19
A system for cooling a plasma processing system comprising:
- a process tube;
- a shield surrounding the process tube for cooling the process tube using vaporized coolant;
- and
- a flow rate control device for controlling a flow rate of liquid coolant within the system to ensure that the liquid coolant is substantially completely vaporized,
- wherein the shield comprises plural ribs with plural spray nozzles for vaporizing the liquid coolant and applying the vaporized coolant to an exterior of the process tube adjacent to the plural ribs.
A system for cooling a plasma processing system comprising:
- a process tube;
- a shield surrounding the process tube for cooling the process tube using vaporized coolant;
- and
- a flow rate control device for controlling a flow rate of liquid coolant within the system to ensure that the liquid coolant is substantially completely vaporized,
- wherein the shield comprises plural ribs with plural orifices for cooling the process tube by applying the vaporized coolant to an exterior of the process tube adjacent to the plural ribs.
A method for cooling a plasma processing system comprising the steps of:
- surrounding a process tube with a shield having plural ribs;
- cooling the process tube using vaporized coolant;
- controlling a flow rate of liquid coolant within the system to ensure that the liquid coolant is substantially completely vaporized;
- and
- further comprising the steps of vaporizing the liquid coolant and applying the vaporized coolant to an exterior of the process tube underneath the plural ribs.
A method for cooling a plasma processing system comprising the steps of:
- surrounding a process tube with a shield having plural ribs;
- cooling the process tube using vaporized coolant;
- and
- controlling a flow rate of liquid coolant within the system to ensure that the liquid coolant is substantially completely vaporized,
- wherein the step of cooling comprises the step of vaporizing the liquid coolant and applying the vaporized coolant to an exterior of the shield adjacent the plural ribs.
A method for cooling a plasma processing system comprising the steps of:
- surrounding a process tube with a shield having plural ribs;
- cooling the process tube using vaporized coolant;
- controlling a flow rate of liquid coolant within the system to ensure that the liquid coolant is substantially completely vaporized;
- and
- vaporizing the liquid coolant at plural orifices in each of the plural ribs that are opposite the process tube.
A method for cooling a plasma processing system comprising the steps of:
- surrounding a process tube with a shield having plural ribs;
- cooling the process tube using vaporized coolant;
- controlling a flow rate of liquid coolant within the system to ensure that the liquid coolant is substantially completely vaporized;
- and
- vaporizing the liquid coolant at an orifice at an intersection of a manifold of the shield and each of the plural ribs.
A method for cooling a plasma processing system comprising the steps of:
- surrounding a process tube with a shield having plural ribs;
- cooling the process tube using vaporized coolant;
- controlling a flow rate of liquid coolant within the system to ensure that the liquid coolant is substantially completely vaporized;
- and
- vaporizing the liquid coolant at an orifice forming a coolant entry hole in a manifold of the shield.
Dependencies are inferred from the claim text.