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US 6,381,796 B1Granted
Spinning washer for wafers
AssigneeDisco Corporation
InventorYoshimi Sato
Life of this patent
Estimating the term…
Abstract
Disclosed is an improved spinning washer comprising: a spinning table for fixedly holding a wafer to be washed; water flushing device; first brush which can be put in coplanar position relative to the lower surface of the wafer round the circumference of the spinning table; and second brush confronting the first brush. The second brush can be put in contact with the upper surface of the wafer in its operative position. The opposite surfaces and circumference side of the wafer can be washed without the fear of breaking the wafer no matter how it may be thin.
Claims3
A spinning washer comprising:
- a spinning table for fixedly holding a wafer, the spinning table being capable of turning at a high speed;
- water flushing means for flushing water to the wafer held on the spinning table;
- first brush means which can be put in coplanar position relative to the lower surface of the wafer around the circumference of the spinning table;
- and
- second brush means confronting the first brush means, the second brush means being adapted to be selectively put in operative or inoperative position, the second brush means being put in contact with the upper surface of the wafer in the operative position.
2 more elements
Dependencies are inferred from the claim text.