Exposure control method, exposure apparatus and device manufacturing method

Abstract

When a pattern on a reticle (8) is illuminated by illuminating light from a light source (1) so as to be projected onto a substrate (11) to expose the same, the illuminating light is diverted by a half-mirror (13), the amount of exposure is measured on the optical path of the diverted illuminating light and the amount of exposure of the substrate is controlled based upon the result of such measurement. The position of the half-mirror (13) is set in such a manner that the optical path of the diverted illuminating light passes through part of an optical element (5) situated on a side of the half-mirror (13) that faces the light source (1), and the amount of exposure is measured on the optical path of the diverted illuminating light following its passage through the optical element. This makes it possible to reduce the space for exposure measurement that is necessary to control the amount of exposure.

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