Scan-type reducing projection exposure method and apparatus

Abstract

A scan-type reducing projection exposure method, which can reduce the influence of machining errors upon the focusing characteristic of a lens system, by: preparing test patterns distributed in an exposure area; projecting the test patterns onto a photosensitive member, while changing a scan direction of a scan-type reducing projection exposure apparatus; developing the photosensitive member to produce photosensitive patterns; measuring dimensions of predetermined parts of the photosensitive patterns to obtain a distribution of the dimensions of the photosensitive patterns in the exposure areas; determining a scan direction in accordance with dimension distribution obtained in said scanning step; and performing an exposure using the determined scanning direction.

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