CMOS chemical bath purification
AssigneeAdvanced Micro Devices, Inc.
InventorJames Clayton Stice
Life of this patent
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Abstract
CMOS processing is enhanced via a method and system that use a chemical bath purification process. According to an example embodiment of the present invention, solution from a CMOS wet chemical bath is passed over a powered circuit. The powered circuit plates out copper from the solution, and the solution is then returned to the bath. By removing copper from the chemical bath in this manner, cross-contamination of wet chemical equipment is reduced, and the need for redundant tool sets can be eliminated.
Claims19
A method for purifying a CMOS processing chemical bath, the method comprising:
- passing solution from the chemical bath over a powered circuit and through a filter arrangement;
- plating out copper from the solution via the powered circuit;
- and
- returning the solution to the chemical bath.
A method for purifying a CMOS processing chemical bath, the method comprising:
- supplying a filter arrangement;
- supplying a first fluid line from the bath to the filter arrangement and back to the bath;
- supplying a first pump coupled to the first fluid line and adapted to draw solution from the chemical bath, deliver the solution to the filter arrangement, and return the solution to the chemical bath;
- supplying a fluid recycle loop coupled to the filter arrangement and having a second fluid line, a second pump, a cathode, an anode, and a power supply coupled to the cathode and anode;
- using the first fluid line and the first pump, delivering the CMOS chemical bath solution to the filter arrangement;
- using the second fluid line and the second pump, recycling the delivered CMOS chemical bath solution through the fluid recycle loop;
- supplying power via the power supply to the anode and cathode and plating out copper in the solution at the recycle loop;
- and
- returning the solution to the CMOS processing chemical bath.
A system for purifying a CMOS processing chemical bath, the system comprising:
- means for plating out copper from the bath;
- means for filtering the solution;
- and
- means for delivering solution to the means for plating out copper from the solution and to the means for filtering the solutions, and returning the solution to the bath from the means for plating out copper.
A system for purifying a CMOS processing chemical bath having a solution, the system comprising:
- a filter arrangement;
- a circuit coupled to a power supply and adapted to plate out copper from a solution;
- a first fluid line extending from the chemical bath to the filter arrangement;
- a second fluid line extending from the filter arrangement to the chemical bath;
- and
- a first pump adapted to pump the solution to through the filter arrangement and over the circuit via the first and second fluid lines.
Dependencies are inferred from the claim text.