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AssigneeKokusai Electric Corporation
InventorsKouji Tometsuka, Mitsuhiro Hirano, Tetsuya Marubayashi
Estimating the term…
A substrate processing apparatus comprises a semiconductor wafer processing chamber, a wafer transfer device, a wafer cassette holding unit, a wafer cassette transfer device and a wafer cassette bringing in/out section disposed in this order and a housing. The wafer cassette holding unit is movable between a wafer processing time position and a maintenance time position thereof and the wafer cassette transfer device is movable between a wafer processing time position and a maintenance time position thereof. The wafer cassette bringing in/out section is capable of rotating forward of the housing, whereby the front face of said housing is opened. With the wafer cassette holding unit being positioned at the maintenance time position thereof, the wafer cassette transfer device being positioned at the maintenance time position thereof and the wafer cassette bringing in/out section being rotated forward of the housing to open the front face thereof, maintenance of the wafer transfer device can be performed from the front face of the housing.
A maintenance method for a substrate processing apparatus which comprises a substrate processing chamber, a substrate transfer device and a substrate carrier holding unit, wherein said substrate processing chamber, said substrate transfer device and said substrate carrier holding unit are disposed in this named order, and said substrate carrier holding unit is movable between a first substrate processing time position and a first maintenance time position, comprising the steps of:
A maintenance method for a substrate processing apparatus which comprises a substrate processing chamber, a substrate carrier transfer device, a substrate carrier bringing in/out section and a housing for covering said substrate processing chamber, said substrate carrier transfer device and said substrate carrier bringing in/out section, wherein said substrate processing chamber, said substrate carrier transfer device and said substrate carrier bringing in/out section are disposed in this named order, and said substrate carrier bringing in/out section is capable of rotating forward of said housing, whereby at least a portion of a front face of said housing can be opened, comprising the steps of:
A maintenance method for a substrate processing apparatus which comprises a substrate processing chamber, a substrate transfer device, a substrate carrier holding unit, a substrate carrier transfer device and a substrate carrier bringing in/out section in this named order, comprising the steps of:
Dependencies are inferred from the claim text.