Liquid vaporizers for semiconductor processing systems

An apparatus for vaporizing liquid-gas mixtures passing therethrough en route to a semiconductor processing chamber, comprising;

• a vessel comprising a thermally-conductive material and having an inlet and an outlet, said inlet being operably connected to said outlet by a plurality of passages within said vessel;
• a heat source in communication with said vessel for heating an outer surface of said vessel to a desired, controllable temperature;
• and
• a heated, insulated passageway coupling said vessel outlet to said processing chamber;
• wherein said passages have a cumulative surface area that is at least two (2) times greater than an internal surface area of an identical-sized vessel without said passages.

A liquid vaporizer system, comprising:

• a vaporizer unit configured to receive and at least partially vaporize a low vapor pressure metal-containing liquid;
• and
• a vessel having an inlet, an outlet and an outer surface;
• said vessel inlet being operably connected to said vaporizer unit;
• said vessel inlet and vessel outlet being connected by a plurality of passages within said vessel, said plurality of passages having a greater surface area than said outer surface;
• and
• said vessel outlet coupled to a substrate processing chamber.