Method and apparatus for improving pattern fidelity in diffraction-limited imaging
OwnerSteven R. J. Brueck, Xiaolan Cheninventors
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OwnerSteven R. J. Brueck, Xiaolan Cheninventors
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The present invention involves the use of pupil plane filters to enhance optical imaging for both lithography and microscopy. The present invention includes numerous pupil plane filter strategies for enhancing optical lithography. A square pupil plane filter suitably restricts the imaging to a nearly diffraction limited regime. Moreover, pupil plane filters are suitably used in off-axis illumination (OAI) and imaging interferometric lithography (ILL). The techniques of OAI and ILL along with the use of pupil-plane filters are applicable in, for example, any diffraction-limited situation where the limit is imposed by the characteristics of the optical system rather than the transmission medium and where the illumination system is under the control of the experimenter.
Image transmission apparatus comprising an imaging lens system with a Fourier plane disposed therein, a lens opening disposed in the Fourier plane and having a numerical aperture (N.A.) configured to provide image transmission at different illumination directions at ,m optimized level of κ1 in the simplified Raleigh resolution criteria CD = κ 1 λ NA
Image transmission apparatus comprising a substrate having a photosensitive medium, a mask, an illumination system configured to illuminate said mask, and an imaging lens system between said mask and said substrate;
A method of transmitting an image from a mask to a substrate having a photosensitive medium, comprising the steps of
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