Exposure apparatus, method of controlling same, and device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorTakashi Mouri
Life of this patent
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Abstract
An exposure apparatus exposes a substrate to a pattern on a reticle in accordance with a job transferred to the apparatus proper and by executing predetermined calibration processing. The apparatus has a function which, when a job and a reticle used in exposure of a substrate in a current lot are the same as a job and a reticle that were used in exposure of a substrate in a preceding lot, bypasses re-transfer of a job to the apparatus proper and/or the calibration processing in regard to exposure of the current lot.
Claims9
An exposure apparatus for executing predetermined calibration processing and exposing a substrate to a pattern on a reticle in accordance with a job representing exposure parameters for one lot, the job transferred to the apparatus, said apparatus comprising:
- determination means for determining whether a job and a reticle used to expose a current lot are the same as a job and a reticle used to expose a preceding lot;
- and
- bypass means for bypassing re-transfer of a job to the apparatus and/or the calibration processing when said determination means determines that the job and the reticle used to expose the current lot and the job and the reticle used to expose the preceding lot are the same.
A method for manufacturing a device by exposing a substrate to a pattern on a reticle using an exposure apparatus apparatus for executing predetermined calibration processing and exposing a substrate to a pattern on a reticle in accordance with a job representing exposure parameters for one lot, the job transferred to the apparatus, comprising the steps of:
- providing a determination means for determining whether a job and a reticle used to expose a current lot are the same as a job and a reticle used to expose a preceding lot;
- and
- providing a bypass means for bypassing re-transfer of a job to the apparatus and/or calibration processing when said determination means determines that a job and a reticle used to expose the current lot and a job and a reticle used to expose the preceding lot are the same,
- wherein exposure of the current lot is performed upon the bypass means bypassing the re-transfer of a job to the apparatus and/or the calibration processing.
A method of controlling an exposure apparatus for executing predetermined calibration processing and exposing a substrate to a pattern on a reticle in accordance with a job representing exposure parameters for one lot, the job transferred to the apparatus, comprising:
- a determination step of determining whether a job and a reticle used to expose a current lot are the same as a job and a reticle used to expose a preceding lot;
- and
- a bypass step of bypassing re-transfer of a job to the apparatus and/or the calibration processing when said determination step determines that the job and the reticle used to expose the current lot and the job and the reticle used to expose the preceding lot are the same.
Dependencies are inferred from the claim text.