Stage system and exposure apparatus, and device manufacturing method using the same

An exposure apparatus, comprising:

• an exposure system for performing an exposure process to a substrate to be exposed;
• and
• a stage system including (i) a movable stage, (ii) a stage base having a guiding surface for supporting said movable stage thereon, (iii) a gas bearing disposed between said guiding surface and said movable stage, and (iv) a preloading mechanism for producing a magnetic attraction force between said guiding surface and said movable stage;
• wherein at least said guiding surface of said stage base is made of a material having a product of a residual magnetic flux density Br and a holding force Hc in a hysteresis curve, not greater than 100 J/m3.

A device manufacturing method, comprising the steps of:

• preparing an exposure apparatus comprising:
• an exposure system for performing an exposure process to a substrate to be exposed;
• and a stage system including (i) a movable stage, (ii) a stage base having a guiding surface for supporting said movable stage thereon, (iii) a gas bearing disposed between said guiding surface and said movable stage, and (iv) a preloading mechanism for producing a magnetic attraction force between said guiding surface and said movable stage, wherein at least said guiding surface of said stage base is made of a material having a product of a residual magnetic flux density Br and a holding force Hc in a hysteresis curve, not greater than 100 J/m3;
• and
• performing an exposure process to a substrate by use of the exposure apparatus.