Semiconductor processing using vapor mixtures
AssigneeSemitool, Inc.
InventorsEric J. Bergman, Robert W. Berner, David Oberlitner
Life of this patent
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Abstract
Processing methods and systems using vapor phase processing streams made from a liquid phase source and feed gas. Some versions use multiple liquid sources and multiple vapor generators which each produce vapors which are mixed. Some of the vapor generators use metering pumps to inject a controlled flow of liquid into a controlled flow of feed gas. In some embodiments the vapors are exsiccated to reduce saturation before being introduced as a processing chamber vapor mixture into a processing chamber. The semiconductor pieces are preferably rotated within the processing chamber and can be processed in batches.
Claims19
A method for processing a semiconductor piece, comprising the steps of:
- placing the piece in a processing vessel;
- contacting a feed gas with a source liquid to generate a vapor;
- supplying the vapor to the processing vessel;
- rotating the semiconductor piece within the processing vessel;
- and
- spraying the vapor onto the semiconductor piece while the semiconductor piece is rotating.
A method for processing a semiconductor piece comprising the steps of:
- placing the semiconductor piece into a processing vessel;
- contacting a first feed gas with a first source liquid including aqueous hydrogen fluoride to generate a vapor;
- mixing the vapor with a non-reactive dilution gas to make a diluted vapor;
- and
- supplying the diluted vapor into the processing chamber.
A method for processing a semiconductor article, comprising the steps of:
- placing the semiconductor article into a processing vessel;
- contacting a first feed gas flow with a first source liquid including aqueous hydrogen fluoride, in a first vapor generator, to generate a first vapor;
- contacting a second feed gas flow with a second source liquid including an organic solvent, in a second vapor generator, to generate a second vapor;
- mixing the first vapor and the second vapor to form a mixed vapor;
- and
- supplying the mixed vapor into the processing vessel.
A method for processing semiconductor pieces comprising the steps of:
- positioning an array of semiconductor pieces into a processing chamber;
- generating at least one vapor stream from at least one vapor generator by combining a feed gas and at least one source liquid;
- supplying the at least one vapor stream to the processing chamber;
- and
- rotating the array of semiconductor pieces within the processing chamber in the presence of the vapor.
Dependencies are inferred from the claim text.