Stripping method

A method of manufacturing an electronic device including the steps of applying an antireflective composition to a substrate to form an antireflective layer, applying a photoresist composition to the antireflective layer to form a photoresist layer on the ancireflective layers exposing the photoresist layer through a photomask to a source of activating radiation, developing the photoresist layer to produce a pattern, etching the photoresist to transfer the pattern to the substrate, and removing the photoresist layer and the antireflective layer, wherein the antireflective layer is removed by a method comprising the step of contacting the antireflective composition with a stripping composition for a period of time to remove the antireflective composition, wherein the stripping composition comprises one or more polar aprotic solvents and one or more aggressive bases and wherein the antireflective composition comprises polymer binder and one or more cross-linking agents.

A method of reworking a substrate including the steps of applying an antireflective composition to a substrate to form an antireflective layer, applying a photoresist composition to the antireflective layer to form a photoresist layer on the antireflective layer, removing the photoresist layer, and removing the antireflective layer, wherein the antireflective layer is removed by a method comprising the step of contacting the antireflective composition with a stripping composition for a period of time to remove the antireflective composition wherein the stripping composition comprises one or more polar aprotic solvents and one or more aggressive bases and wherein the antireflective composition comprises polymer binder and one or more cross-linking agents.