X-ray projection exposure apparatus and a device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorsShinichi Hara, Masami Tsukamoto
Life of this patent
Estimating the term…
Abstract
An X-ray projection exposure apparatus includes a mask chuck for holding a reflection X-ray mask having a mask pattern thereon, a void being formed between the mask and the mask chuck, a wafer chuck for holding a wafer onto which the mask pattern is transferred, an X-ray illuminating system for illuminating the reflection X-ray mask, held by the mask chuck, with X-rays, an X-ray projection optical system for projecting the mask pattern of the reflection X-ray mask onto the wafer held by the wafer chuck with a predetermined magnification and a supply for supplying the void formed between the mask and the mask chuck with a cooling gas for cooling the mask.
Claims28
An X-ray projection exposure apparatus operating in a vacuum or a reduced-pressure environment, said apparatus comprising:
- a mask chuck for holding a reflection X-ray mask having a mask pattern thereon in the vacuum or in the reduced pressure environment, a void being formed between the mask and said mask chuck;
- a wafer chuck for holding a wafer onto which the mask pattern is transferred;
- an X-ray illuminating system for illuminating the reflection X-ray mask, held by said mask chuck, with X-rays;
- an X-ray projection optical system for projecting the mask pattern of the reflection X-ray mask onto the wafer held by said wafer chuck with a predetermined magnification;
- and
- supply means for supplying the void formed between the mask and said mask chuck with a cooling gas for cooling the mask.
An X-ray projection exposure apparatus operating in a vacuum or a reduced-pressure environment, said apparatus comprising:
- a mask chuck for holding a reflection X-ray mask having a mask pattern thereon in the vacuum or in the reduced pressure environment, a void being formed between the mask and said mask chuck;
- an X-ray illuminating system for illuminating the reflection X-ray mask, held by said mask chuck, with X-rays;
- and
- supply means for supplying the void formed between the mask and the mask chuck with a cooling gas for cooling the mask.
Dependencies are inferred from the claim text.