Capacitance gauge tracking apparatus used for exposure system for manufacturing semiconductor device, method for the tracking surface of semiconductor device using the same, leveling apparatus including tracking apparatus, and leveling method

Abstract

A capacitance gauge tracking apparatus used for an exposure system for manufacturing a semiconductor device, a method for tracking a surface of the semiconductor device, a leveling apparatus and a leveling method are provided. The capacitance gauge tracking apparatus includes a ground unit, a probe unit and a gauge unit. The ground unit is connected to a semiconductor substrate. The probe unit is spaced apart from the surface of the semiconductor substrate to be tracked and a constant current of at least two frequency bands is applied to the probe unit. A constant current of a low frequency is applied to the probe unit to thereby perform global leveling by global tracking of the entire surface of the semiconductor substrate and a constant current of a high frequency is applied to the probe unit to thereby perform local leveling by local tracking on the semiconductor substrate.

Dependencies are inferred from the claim text.