Resist composition
AssigneeNippon Zeon Co., Ltd.
InventorsNobunori Abe, Nobukazu Takahashi
Life of this patent
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Abstract
The invention provides a resist composition which comprises a polymer (a) having structural units with an acid-labile group, and a radiation-sensitive compound (b) which forms an acid upon exposure to activated radiation, wherein the polymer (a) is a polymer obtained by polymerizing 10 to 100 wt. % of a (meth)acrylic ester (i) having, as an alcohol residue, an allyl group with at least two substituent groups and 0 to 90 wt. % of a monomer (ii) copolymerizable with the (meth)acrylic ester, and has excellent sensitivity, resolution and heat resistance, and a pattern forming process making use of the resist composition.
Claims9
A pattern forming process, comprising the steps of
- (1) coating a substrate with a solution of a resist composition comprising a polymer (a) having structural units with an acid-labile group, and a radiation-sensitive compound (b) which forms an acid upon exposure to activated radiation, wherein the polymer (a) is a polymer obtained by polymerizing 10 to 100 weight percent of a (meth)acrylic ester (i) having, as an alcohol residue, an allyl group with at least two substituent groups, and 0 to 90 weight percent of a monomer (ii) copolymerizable with the (meth)acrylic ester;
- (2) drying the solution to form a resist film;
- (3) exposing the resist film to activated radiation according to a pattern;
- (4) dissolving and removing the exposed area of the resist film with an alkaline developing solution to develop the resist film;
- and
- (5) further exposing a resist pattern formed in the developing step (4) to activated radiation.
A resist composition comprising a polymer (a) having structural units with an acid-labile group, and a radiation-sensitive compound (b) which forms an acid upon exposure to activated radiation, wherein the polymer (a) is a polymer obtained by polymerizing 10 to 100 weight percent of a (meth)acrylic ester (i) having, as an alcohol residue, an allyl group with at least two substituent groups, and 0 to 90 weight percent of an aromatic vinyl compound (ii) selected from the group consisting of styrene and hydroxystyrene, and wherein the (meth)acrylic ester (i) is 1-methyl-2-butenyl methacrylate, 1-methyl-2-butenyl acrylate, 3-methyl-2-butenyl methacrylate or 3-methyl-2-butenyl acrylate.
Dependencies are inferred from the claim text.