Photomask provided with an ESD-precluding envelope
AssigneeU.S. Philips Corporation
InventorsJan W. Gemmink, Kees Van Hasselt
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Abstract
A photomask (1) comprises a transmissive base plate (2), a first side of which is provided with a layer of a metallic mask material (4). In this layer, a mask pattern (6) is formed which is enclosed in an outer region (5) of mask material. The photomask is encapsulated in a protection layer (9) of transmissive and conductive material, which, on the first side of the base plate, is formed at such a distance from said first side that said protection layer remains free of the mask pattern. The photomask is thus protected against electrostatic discharges which could damage the mask pattern, and the projection of the mask pattern is not adversely affected.
Claims6
A photomask comprising a base plate of a radiation-transmitting and electrically insulating material, a first side of which is provided with a layer of an electroconductive mask material wherein, inside a closed edge of that material, a mask pattern to be imaged is formed, the photomask being entirely enveloped in a protective layer of a radiation-transmitting, electroconductive material, characterized in that the protective layer is provided in a substantially homogeneous thickness on the first side of the base plate, at such a distance from said base plate that the protective layer remains free of the mask pattern to be imaged.
Dependencies are inferred from the claim text.