Process for preparing water dispersible negative-type photosensitive compositions
AssigneeIndustrial Technology Research Foundation
InventorsHsien Kuang Lin, Jauder Jeng
Life of this patent
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Abstract
The present invention discloses a process for preparing a water-dispersible photosensitive composition, including the steps of: (a) adding an unsaturated photomonomer and/or a plasticizer to a carboxyl-group bearing acrylic resin solution which contains at least an organic solvent; (b) distilling and removing said organic solvent to form a resin paste; (c) dissolving a photoinitiator and an alkaline into said resin paste; (d: adding deionized water and mixing thoroughly to form an emulsion; and (e) adjusting the viscosity or said emulsion with a water-soluble resin.
Claims20
A process for preparing a water-dispersible photosensitive composition, comprising the steps of:
- (a) adding an unsaturated photomonomer and/or a plasticizer to a carboxyl-group bearing acrylic resin solution which contains at least an organic solvent;
- (b) distilling and removing said organic solvent to form a resin paste;
- (c) dissolving a photoinitiator and an alkaline into said resin paste;
- (d) adding deionized water and mixing thoroughly to form an emulsion;
- and
- (e) adjusting the viscosity of said emulsion with a water-soluble resin.
Dependencies are inferred from the claim text.