Pattern forming material and pattern forming method
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsTakahiro Matsuo, Masayuki Endo, Masamitsu Shirai, Masahiro Tsunooka
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Abstract
A pattern forming material includes a binary copolymer represented by the following general formula or a ternary or higher copolymer obtained by further polymerizing the binary copolymer with another group: wherein R1 indicates a hydrogen atom or an alkyl group; R2 and R3 independently indicate a hydrogen atom, an alkyl group, a phenyl group or an alkenyl group or together indicate a cyclic alkyl group, a cyclic alkenyl group, a cyclic alkyl group having a phenyl group or a cyclic alkenyl group having a phenyl group; R4 indicates a hydrogen atom or an alkyl group; x satisfies a relationship of 0<x<1; and y satisfies a relationship of 0<y<1.
Claims1
A pattern forming material comprising a copolymer including a first group for generating a base through irradiation with an energy beam and a second group having an acidic property;
- wherein said copolymer is a binary copolymer represented by the following general formula or a ternary or higher copolymer obtained by further polymerizing said binary copolymer with another group:
- wherein R1 indicates a hydrogen atom or an alkyl group;
- R2 and R3 independently indicate a hydrogen atom, an alkyl group, a phenyl group or an alkenyl group, or together indicate a cyclic alkyl group, a cyclic alkenyl group, a cyclic alkyl group having a phenyl group or a cyclic alkenyl group having a phenyl group;
- R4 indicates a hydrogen atom or an alkyl group;
- x satisfies a relationship of 0<x<1;
- and y satisfies a relationship of 0<y<1.
Dependencies are inferred from the claim text.