Back to results
US 6,306,495 B1Granted
Film for use in microelectronic devices and methods of producing same
AssigneeUniversity of North Texas
InventorJeffry A. Kelber
Life of this patent
Estimating the term…
Abstract
The present invention provides thin films for use in microelectronic devices. In one aspect, the present invention provides a copper diffusion barrier. In another aspect, the present invention provides a polymer film for various applications including use as a dielectric insulator and surface modification layers. Methods for the production of the films are also disclosed.
Claims13
A microelectronic device comprising a substrate and a thin carbon-silicon polymer film covalently bound thereto, wherein said thin polymer film is being covalently bound to said substrate through vinyl silane monomers.
Dependencies are inferred from the claim text.