Back to results
US 6,299,462 B1Granted
Self positioning, passive MEMS mirror structures
AssigneeXerox Corporation
InventorDavid K. Biegelsen
Life of this patent
Estimating the term…
Abstract
Provided is a micro-machine mirror structure with hinges which after being released from a sacrificial layer will result in the mirror structure being lifted out of the plane of the substrate to a fixed defined geometric angle. Stresses in a metal layer of the mechanism, along with a constraint mechanism, causes the mirror structure to be maintained at the desire angle.
Claims23
A method for forming a MEMS structure comprising the steps of:
- depositing a first layer of elastic material on a substrate, the elastic material having an inherent stress gradient, the inherent stress gradient biasing the elastic material away from the substrate;
- photolithographically patterning the layer of elastic material to form at least one spring having a free portion and an anchor portion;
- depositing a second layer of material on a substrate, which is a non-stressed material having a minimal inherent stress gradient;
- depositing a hinge on or over a portion of the first layer and a portion of the second layer;
- configuring a constraint mechanism, such that at least a portion of the second layer is in control of the constraint mechanism;
- under-cut etching a portion of the substrate under the at least one spring and the second layer to release the free portion of the at least one spring and the second layer from the substrate, and the anchor portion of the at least one spring contact remaining fixed to the substrate, wherein the free portion is biased to move away from the substrate when released until constrained by the constraint mechanism.
3 more elements
A method for forming a micro-structure comprising the steps of:
- depositing a first layer of elastic material on or above a substrate, the elastic material having an inherent stress gradient, the inherent stress gradient biasing the elastic material away from the substrate;
- patterning the first layer of elastic material to form at least one spring having a free portion and an anchor portion;
- depositing a second layer of material on or above the substrate, which is a non-stressed material having a minimal inherent stress gradient;
- defining at least a portion of the second layer to be a constraint plate;
- depositing a hinge on or over a portion of the spring and a portion of the constraint plate;
- forming a constraint mechanism, on or above the substrate to constrain movement of the constraint plate or the hinge;
- and
- etching a portion of the substrate under the at least one spring and the constraint plate to release the free portion of the at least one spring and the constraint plate, the anchor portion of the spring remaining fixed to the substrate, wherein the free portion is biased to move away from the substrate when released until constrained by operation of the constraint mechanism.
5 more elements
A method for forming a micro-structure comprising the steps of:
- forming a first layer of material on or above a substrate, the first layer having an inherent stress gradient biasing the first layer away from the substrate;
- patterning the first layer to form at least one spring having a free portion and an anchor portion;
- forming a second layer of material on or above the substrate, the second layer being a non-stressed material;
- forming a hinge on or over a portion of the first layer and a portion of the second layer;
- forming a constraint mechanism, on or above the substrate to constrain movement of the second layer or the hinge;
- etching under the at least one spring and the second layer to release the free portion of the at least one spring and the second layer;
- and
- constraining movement of the free portion of the at least one spring by interaction of the hinge, the second layer and the constraint mechanism.
5 more elements
Dependencies are inferred from the claim text.