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US 6,296,985 B1Granted
Positive photoresist composition comprising a polysiloxane
AssigneeFuji Photo Film Co., Ltd.
InventorsKazuyoshi Mizutani, Shoichiro Yasunami
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Abstract
A positive photoresist composition comprising (a) an acid-decomposable polysiloxane having a structural unit represented by formula (IV): wherein Z′ is a phenyl ring substituted with an acid-decomposable group and (b) a compound which decomposes upon exposure to generate an acid.
Claims2
A positive photoresist composition comprising (a) an acid-decomposable polysiloxane having a structural unit represented by formula (IV)
- wherein n represents an integer of from 1 to 6;
- X represents a single bond or a divalent linking group;and Z′ represents a monovalent group selected from the group consisting of the groups represented by the following formula (V-1) and (V-2):
- wherein R represents an acid-decomposable group;
- Y represents a hydrogen atom, a straight chain, branched or cyclic alkyl group, an aryl group, or an aralkyl group;
- 1 represents an integer of from 1 to 3;
- and m represents an integer of from 1 to 3, and (b) a compound which is decomposed by exposure to generate an acid.
3 more elements
Dependencies are inferred from the claim text.