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AssigneeCanon Kabushiki Kaisha
InventorsYasuo Takahashi, Naoko Miura
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A method for manufacturing an electron-emitting device processing an electroconductive film upon which an electron-emission region is formed is characterized in that the formation process of formation of the electron-emission region includes a process of application of metal compound-containing material and film thickness controlling agent to the substrate. A method for manufacturing an electron source comprises a substrate, and a plurality of electron-emitting devices arrayed upon the substrate, wherein the electron-emitting devices are manufactured according to the method for manufacturing the electron-emitting device. A method for manufacturing an image-forming apparatus comprises a substrate, an electron source comprised of a plurality of electron-emitting devices arrayed upon the substrate, and an image-forming member, wherein the electron-emitting devices are manufactured according to the method for manufacturing an electron-emitting device.
A method for manufacturing an electron-emitting device possessing an electroconductive film including an electron-emitting region, wherein the method comprises forming the electroconductive film in which the electron-emitting region is to be formed by a procedure comprising:
A method for manufacturing an electron-emitting device with an electroconductive film including an electron-emitting region, wherein the method comprises forming the electroconductive film in which the electron-emitting region is to be formed by a procedure comprising the steps of:
Dependencies are inferred from the claim text.