Method and system for manufacturing a photocathode
AssigneeLitton Systems, Inc.
InventorsJames D. Pruet, David G. Couch
Life of this patent
Estimating the term…
Abstract
A system (10) for manufacturing a photocathode includes a support (12) and a polishing pad (14) disposed adjacent the support (12). The polishing pad (14) is operable to polish the photocathode in response to movable contact of the photocathode relative to the polishing pad (14). The system (10) also includes a rinsing system (16) coupled to the support (12). The rinsing system (16) is operable to deliver a rinsing agent to the polishing pad (14). The system (10) further includes a control system (62) operable to automatically regulate delivery of the rinsing agent to the rinsing system (16) at a predetermined time period.
Claims23
A system for manufacturing a photocathode, comprising:
- a support;
- a polishing pad disposed adjacent the support, the polishing pad operable to polish the photocathode in response to movable contact of the photocathode relative to the polishing pad;
- a rinsing system coupled to the support and operable to retain a polishing compound on the polishing pad during polishing of the photocathode, the rinsing system further operable to uniformly deliver a rinsing agent to the polishing pad;
- and
- a control system operable to automatically regulate the delivery of the rinsing agent to the rinsing system at a predetermined time period.
A method for manufacturing a photocathode comprising:
- positioning a polishing pad on a support;
- disposing a rinsing system adjacent the polishing pad;
- providing a polishing compound to the polishing pad, the rinsing system operable to retain the polishing compound on the polishing pad;
- polishing the photocathode with the polishing pad and the polishing compound by movable contact of the photocathode relative to the polishing pad and the polishing compound;
- automatically and uniformly distributing a rinsing agent to the polishing pad via the rinsing system at a predetermined time period;
- and
- rinsing the photocathode with the rinsing agent prior to removing the photocathode from contact with the polishing pad and the polishing compound.
A method for manufacturing a photocathode comprising:
- positioning a polishing pad on a support;
- disposing a rinsing element adjacent the polishing pad, the rinsing element comprising a plurality of passages operable to uniformly distribute a rinsing agent to the polishing pad;
- providing a polishing compound to the polishing pad;
- polishing the photocathode with the polishing pad and the polishing compound by movable contact of the photocathode relative to the polishing pad and the polishing compound;
- delivering a rinsing agent to the polishing pad via the passages of the rinsing element;
- and
- rinsing the photocathode with the rinsing agent as the photocathode is removed from the polishing pad, wherein a surface tension of the rinsing agent removes the polishing compound from a polishing surface of the photocathode prior to exposure of the polishing surface of the photocathode to an oxidating environment.
Dependencies are inferred from the claim text.