Patterned photoresist structures having features with high aspect ratios and method of forming such structures

An ink jet print head, comprising:

• a substrate;
• a permanent patterned layer formed over the substrate, the permanent patterned layer is a single layer and having a surface, and the permanent patterned layer comprising a polymeric resist material and including a plurality of features each having a height and a width, the plurality of features including at least two features having different aspect ratios from each other and at least one feature having an aspect ratio of at least about 2:1;
• wherein the permanent patterned layer is formed by photolithography;
• at least one energy source on the substrate, each energy source being selectively activated to eject an ink droplet from the print head;
• and
• a cover over the permanent patterned layer and forming a plurality of ink passages with the features and nozzles at open ends of at least one of ink passages.