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US 6,294,025 B1Granted
Device for producing oxidic thin films
AssigneeTheva Dunnschichttechnik GmbH
InventorHelmut Kinder
Life of this patent
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Abstract
The invention relates to an apparatus for the production of thin oxide coatings, having a vacuum chamber wherein an oxygen chamber with an opening and a rotary substrate holder overlapping the latter are disposed. For the rotary arrangement of the substrate holder a rotary mounting is provided, which engages a circumferential portion of the substrate holder.
Claims25
Apparatus for the production of thin oxide coatings comprising:
- a vacuum chamber,
- an oxygen chamber in said vacuum chamber and having an opening,
- a rotary substrate holder, adapted to sequentially allow a substrate to have access to a coating material and oxygen chamber overlap, sealing said opening of said oxygen chamber, and
- a rotary mounting provided for the rotary arrangement of the substrate holder which engages a circumferential portion of the substrate holder.
1 more element
Dependencies are inferred from the claim text.