Polishing solution supply system
AssigneeEbara Corporation
InventorKiyotaka Kawashima
Life of this patent
Estimating the term…
Abstract
A polishing solution supply system can prevent precipitation of solutes on delivery pipes or interior walls of holding tanks so that a polishing solution of a constant solution concentration can be supplied to a polishing tool. The polishing solution supply system includes a stock solution supply source, a dilution solution supply source, and a mixing section for mixing a stock solution and a dilution solution to formulate the polishing solution. The mixing section is sealed hermetically to exclude external atmosphere. Delivery lines deliver the polishing solution to each of plural polishing sections.
Claims20
A polishing system comprising:
- a polishing section for pressing an object to be polished against a polishing tool;
- a delivery line to communicate with an external polishing solution supply source for delivering a polishing solution to said polishing section;
- a flow control device for controlling flow of the polishing solution within said delivery line at a desired flow rate within a range of flow rates in response to a command signal;
- and
- a shutoff valve for stopping the flow of the polishing solution within said delivery line,
- wherein said delivery line comprises a circulation line in which the polishing solution can always flow, and a delivery pipe extending directly from said circulation line toward said polishing section.
A polishing system comprising:
- a polishing section for pressing an object to be polished against a polishing tool;
- a delivery line to communicate with an external polishing solution supply source for delivering a polishing solution to said polishing section;
- a flow control device for controlling flow of the polishing solution within said delivery line at a desired flow rate in response to a command signal;
- and
- a shutoff valve for stopping the flow of the polishing solution within said delivery line,
- wherein said flow control device includes a pressure adjustment valve for adjusting a pressure at a downstream side of said flow control device to a specific value determined by said command signal.
A polishing system comprising:
- a polishing section for pressing an object to be polished against a polishing tool;
- an external polishing solution supply source;
- a delivery line communicating with said external polishing solution supply source for delivering a polishing solution to said polishing section;
- a flow control device for controlling flow of the polishing solution within said delivery line at a desired flow rate within a range of flow rates in response to a command signal;
- and
- a shutoff valve for stopping the flow of the polishing solution within said delivery line,
- wherein said delivery line comprises an extended circulation line in which the polishing solution can always flow and a delivery pipe extending directly from said extended circulation line toward said polishing section.
A polishing system comprising:
- a polishing solution supply system for preparing a polishing solution;
- a plurality of polishing sections for polishing an object;
- by pressing said object against a polishing tool, wherein each of said polishing sections includes a delivery line for communicating with said polishing solution supply system and delivering polishing solution to said respective polishing section;
- and
- a circulation pipe communicating with said polishing solution supply system and said delivery lines of said polishing sections, wherein said circulation pipe is adapted to circulate only unused polishing solution therein.
Dependencies are inferred from the claim text.